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Hydrogen incorporation in dual-mode PECVD amorphous silicon oxide thin films

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http://hal.in2p3.fr/in2p3-00000511
Contributor : Jocelyne Lorgeril <>
Submitted on : Monday, February 22, 1999 - 11:04:00 AM
Last modification on : Wednesday, September 16, 2020 - 4:06:21 PM

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  • HAL Id : in2p3-00000511, version 1

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R. Etemadi, C. Godet, J. Perrin, J.E. Bouree, B. Drevillon, et al.. Hydrogen incorporation in dual-mode PECVD amorphous silicon oxide thin films. Surface and Coatings Technology, Elsevier, 1996, 80, pp.8-12. ⟨in2p3-00000511⟩

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