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High laser damage threshold $HfO_{2}/SiO_{2}$ mirrors manufactured by sputtering process

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http://hal.in2p3.fr/in2p3-00003407
Contributor : Sylvie Flores <>
Submitted on : Wednesday, March 8, 2000 - 4:36:48 PM
Last modification on : Friday, September 10, 2021 - 1:50:03 PM

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  • HAL Id : in2p3-00003407, version 1

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A. Fornier, D. Bernardino, O. Iam, J. Neauport, Frédéric Dufour, et al.. High laser damage threshold $HfO_{2}/SiO_{2}$ mirrors manufactured by sputtering process. Solid State Lasers for Applications (SSLA) to Inertial Confinement Fusion (ICF), Jun 1998, Tucson, United States. pp.250-251. ⟨in2p3-00003407⟩

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