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Electron cyclotron resonance ion source for high currents of mono- and multicharged ion and general purpose unlimited lifetime application on implantation devices

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http://hal.in2p3.fr/in2p3-00004033
Contributor : Lpsc Bibliotheque <>
Submitted on : Thursday, March 2, 2000 - 11:36:39 AM
Last modification on : Thursday, November 19, 2020 - 12:58:18 PM

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  • HAL Id : in2p3-00004033, version 1

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C. Bieth, J.L. Bouly, J.C. Curdy, S. Kantas, P. Sortais, et al.. Electron cyclotron resonance ion source for high currents of mono- and multicharged ion and general purpose unlimited lifetime application on implantation devices. International Conference on Ion sources 8, 1999, Kyoto, Japan. pp.899-901. ⟨in2p3-00004033⟩

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