Annealing kinetics during rapid and classical thermal processing of a laser induced defect in n-type silicon

W.O. Adekoya; J.C. Muller; P. Siffert

Journal articles

Annealing kinetics during rapid and classical thermal processing of a laser induced defect in n-type silicon

W.O. Adekoya J.C. Muller P. Siffert ¹

1 IReS - Institut de Recherches Subatomiques

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Journal articles

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Submitted on : Friday, September 22, 2000 - 8:56:25 AM
Last modification on : Thursday, April 23, 2020 - 2:26:14 PM

Annealing kinetics during rapid and classical thermal processing of a laser induced defect in n-type silicon

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Annealing kinetics during rapid and classical thermal processing of a laser induced defect in n-type silicon

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