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High resolution magnetic patterning using focused ion beam irradiation

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http://hal.in2p3.fr/in2p3-00006349
Contributor : Jocelyne Lorgeril <>
Submitted on : Thursday, September 28, 2000 - 5:08:22 PM
Last modification on : Wednesday, September 16, 2020 - 4:06:33 PM

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  • HAL Id : in2p3-00006349, version 1

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Christophe Vieu, J. Gierk, H. Launois, T. Aign, P. Meyer, et al.. High resolution magnetic patterning using focused ion beam irradiation. Microelectronic Engineering, Elsevier, 2000, 53, pp.191-194. ⟨in2p3-00006349⟩

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