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Low cost ion implantation into silicon and pulsed annealing. application to the manufacturing of solar cells

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http://hal.in2p3.fr/in2p3-00006630
Contributor : Yvette Heyd Connect in order to contact the contributor
Submitted on : Wednesday, October 18, 2000 - 9:09:25 AM
Last modification on : Thursday, April 23, 2020 - 2:26:15 PM

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  • HAL Id : in2p3-00006630, version 1

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J.C. Muller, P. Siffert. Low cost ion implantation into silicon and pulsed annealing. application to the manufacturing of solar cells. International Workshop On Ion Implantation Laser Treatment And Ion Beam Analysis Of Materials, Feb 1981, Bombay, India. pp.81-103. ⟨in2p3-00006630⟩

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