Spontaneous desorption : a controlled phenomenon for surface analysis application ? - part I - new evidence for a sputtering process induced by a well localized field enhanced desorption - IN2P3 - Institut national de physique nucléaire et de physique des particules Accéder directement au contenu
Article Dans Une Revue Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms Année : 1996

Spontaneous desorption : a controlled phenomenon for surface analysis application ? - part I - new evidence for a sputtering process induced by a well localized field enhanced desorption

Sylvie Flores  : Connectez-vous pour contacter le contributeur

https://hal.in2p3.fr/in2p3-00007536

Soumis le : jeudi 11 février 1999-16:23:17

Dernière modification le : jeudi 11 avril 2024-13:18:11

Fichier non déposé

Dates et versions

in2p3-00007536 , version 1 (11-02-1999)

Identifiants

  • HAL Id : in2p3-00007536 , version 1

Citer

H. Allali, O. Debré, B. Lagrange, B. Nsouli, A. Oladipo, et al.. Spontaneous desorption : a controlled phenomenon for surface analysis application ? - part I - new evidence for a sputtering process induced by a well localized field enhanced desorption. Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1996, 108, pp.163-172. ⟨in2p3-00007536⟩

Exporter

BibTeX XML-TEI Dublin Core DC Terms EndNote DataCite

Collections

IN2P3 CNRS UNIV-LYON1 IP2I UDL CMS IPM PHABIO MANOIR THEORIE COSMOLOGIE MATNUC NEUTRINOS_IP2I ONDES_GRAVITATIONNELLES MATICE
5 Consultations
0 Téléchargements

Partager

Gmail Facebook X LinkedIn More