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Spontaneous desorption : a controlled phenomenon for surface analysis application ? - part I - new evidence for a sputtering process induced by a well localized field enhanced desorption

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http://hal.in2p3.fr/in2p3-00007536
Contributor : Sylvie Flores <>
Submitted on : Thursday, February 11, 1999 - 4:23:17 PM
Last modification on : Tuesday, November 19, 2019 - 2:38:24 AM

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  • HAL Id : in2p3-00007536, version 1

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H. Allali, O. Debré, B. Lagrange, B. Nsouli, A. Oladipo, et al.. Spontaneous desorption : a controlled phenomenon for surface analysis application ? - part I - new evidence for a sputtering process induced by a well localized field enhanced desorption. Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, Elsevier, 1996, 108, pp.163-172. ⟨in2p3-00007536⟩

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