Skip to Main content Skip to Navigation
Journal articles

Hydrogen effusion under 6-7-MeV $^{15}$N ions irradiation in oxygen-contaminated thin films of sputtered A-Si:H

Document type :
Journal articles
Complete list of metadata

http://hal.in2p3.fr/in2p3-00007752
Contributor : Sylvie Flores <>
Submitted on : Thursday, March 9, 2000 - 9:51:09 AM
Last modification on : Tuesday, November 19, 2019 - 2:47:06 AM

Identifiers

  • HAL Id : in2p3-00007752, version 1

Collections

Citation

M. Fallavier, J.-P. Thomas, J. Tousset, Y. Monteil, J. Bouix. Hydrogen effusion under 6-7-MeV $^{15}$N ions irradiation in oxygen-contaminated thin films of sputtered A-Si:H. Applied Physics Letters, American Institute of Physics, 1981, 39, pp.490-492. ⟨in2p3-00007752⟩

Share

Metrics

Record views

52