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Iron silicide formed in a-Si:Fe thin films by magnetron co-sputtering and ion implantation

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http://hal.in2p3.fr/in2p3-00012843
Contributor : Jocelyne Lorgeril Connect in order to contact the contributor
Submitted on : Thursday, June 5, 2003 - 3:45:59 PM
Last modification on : Wednesday, September 16, 2020 - 4:06:35 PM

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  • HAL Id : in2p3-00012843, version 1

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M. Nikolaeva, M. Sendova-Vassileva, D. Dimova-Malinovska, D. Karpuzov, J.C. Pivin, et al.. Iron silicide formed in a-Si:Fe thin films by magnetron co-sputtering and ion implantation. Vacuum, Elsevier, 2002, 69, pp.221-225. ⟨in2p3-00012843⟩

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