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Conference papers

Amorphization of tantalum by boron and phosphorus ion implantation

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Conference papers
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http://hal.in2p3.fr/in2p3-00013176
Contributor : Jocelyne Lorgeril <>
Submitted on : Tuesday, April 13, 1999 - 9:45:16 AM
Last modification on : Wednesday, March 10, 2021 - 11:32:13 AM

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  • HAL Id : in2p3-00013176, version 1

Citation

L. Thome, A. Benyagoub, H. Bernas, J.C. Pivin, R.W. Cahn. Amorphization of tantalum by boron and phosphorus ion implantation. Colloquium on Metallurgy 26, Jun 1983, Saclay, France. pp.287-290. ⟨in2p3-00013176⟩

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