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Phosphorous characterization and quantification in CVD SiO2(P,B)/SiO2/si multilayer system by low energy PIXE

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http://hal.in2p3.fr/in2p3-00014246
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Submitted on : Wednesday, December 17, 2003 - 10:53:37 AM
Last modification on : Friday, September 10, 2021 - 1:50:05 PM
Long-term archiving on: : Tuesday, March 30, 2010 - 6:05:11 PM

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B. Nsouli, M. Roumie, K. Zahraman, J.-P. Thomas, M. Nasreddine. Phosphorous characterization and quantification in CVD SiO2(P,B)/SiO2/si multilayer system by low energy PIXE. Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, Elsevier, 2002, 192, pp.311-317. ⟨in2p3-00014246⟩

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