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Charge-state-dependent diffusion and carrier-emission-limited drift of iron in silicon

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http://hal.in2p3.fr/in2p3-00015882
Contributor : Yvette Heyd <>
Submitted on : Tuesday, May 30, 2000 - 2:31:04 PM
Last modification on : Thursday, April 23, 2020 - 2:26:19 PM

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  • HAL Id : in2p3-00015882, version 1

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T. Heiser, A. Mesli. Charge-state-dependent diffusion and carrier-emission-limited drift of iron in silicon. Physical Review Letters, American Physical Society, 1992, 68, pp.978-981. ⟨in2p3-00015882⟩

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