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Journal articles
One-step Growth of Polycrystalline Silicon thin Films at Low-temperature by ARF Excimer Laser-induced Photo-CVD
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IReS - Institut de Recherches Subatomiques (23 rue du Loess - BP 28 - 67037 Strasbourg Cedex 2 - France)
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http://hal.in2p3.fr/in2p3-00015969
Contributor : Yvette Heyd Connect in order to contact the contributor
Submitted on : Monday, June 5, 2000 - 9:49:17 AM
Last modification on : Thursday, April 23, 2020 - 2:26:19 PM
Contributor : Yvette Heyd Connect in order to contact the contributor
Submitted on : Monday, June 5, 2000 - 9:49:17 AM
Last modification on : Thursday, April 23, 2020 - 2:26:19 PM
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- HAL Id : in2p3-00015969, version 1
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CNRS | CGE | IN2P3 | SITE-ALSACE
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M. Elliq, E. Fogarassy, C. Fuchs, J.P. Stoquert, S. de Unamuno, et al.. One-step Growth of Polycrystalline Silicon thin Films at Low-temperature by ARF Excimer Laser-induced Photo-CVD. Applied Surface Science, Elsevier, 1992, 54, pp.35-40. ⟨in2p3-00015969⟩
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