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Si1-chi-ge-chi thin films deposited by the pulsed excimer laser ablation technique

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http://hal.in2p3.fr/in2p3-00015995
Contributor : Yvette Heyd <>
Submitted on : Tuesday, June 6, 2000 - 7:43:13 AM
Last modification on : Thursday, April 23, 2020 - 2:26:19 PM

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  • HAL Id : in2p3-00015995, version 1

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F. Antoni, E. Fogarassy, C. Fuchs, B. Prevot, J.P. Stoquert. Si1-chi-ge-chi thin films deposited by the pulsed excimer laser ablation technique. Symposium B on Photon-Assisted processing of Surfaces and Thin Films of the E-Mrs Spring Conference, May 1995, Strasbourg, France. pp.175-179. ⟨in2p3-00015995⟩

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