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SiO$_2$ thin film deposition by excimer laser ablation from SiO target in oxygen atmosphere

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http://hal.in2p3.fr/in2p3-00016046
Contributor : Yvette Heyd Connect in order to contact the contributor
Submitted on : Wednesday, June 7, 2000 - 8:44:26 AM
Last modification on : Thursday, April 23, 2020 - 2:26:19 PM

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  • HAL Id : in2p3-00016046, version 1

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E. Fogarassy, C. Fuchs, A. Slaoui, J.P. Stoquert. SiO$_2$ thin film deposition by excimer laser ablation from SiO target in oxygen atmosphere. Applied Physics Letters, American Institute of Physics, 1990, 57, pp.664. ⟨in2p3-00016046⟩

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