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Growth kinetics of titanium silicide during heating by RTA and furnace annealing

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http://hal.in2p3.fr/in2p3-00016164
Contributor : Yvette Heyd <>
Submitted on : Thursday, June 29, 2000 - 8:37:56 AM
Last modification on : Thursday, April 23, 2020 - 2:26:19 PM

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  • HAL Id : in2p3-00016164, version 1

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J.P. Ponpon, A. Saulnier. Growth kinetics of titanium silicide during heating by RTA and furnace annealing. Applied Surface Science, Elsevier, 1990, 40, pp.315. ⟨in2p3-00016164⟩

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