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Boron neutralization and hydrogen diffusion in silicon subjected to low-energy hydrogen implantation

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http://hal.in2p3.fr/in2p3-00016180
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Submitted on : Monday, July 3, 2000 - 8:41:19 AM
Last modification on : Thursday, April 23, 2020 - 2:26:19 PM

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T. Zundel, A. Mesli, J.C. Muller, P. Siffert. Boron neutralization and hydrogen diffusion in silicon subjected to low-energy hydrogen implantation. Applied physics. A, Materials science & processing, Springer Verlag, 1989, 48, pp.31. ⟨in2p3-00016180⟩

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