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Excimer laser induced oxidation of ion-implanted Si

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http://hal.in2p3.fr/in2p3-00017473
Contributor : Yvette Heyd Connect in order to contact the contributor
Submitted on : Tuesday, September 26, 2000 - 4:24:59 PM
Last modification on : Thursday, April 23, 2020 - 2:26:19 PM

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E. Fogarassy, C.W. White, A. Slaoui, C. Fuchs, P. Siffert, et al.. Excimer laser induced oxidation of ion-implanted Si. Applied Physics Letters, American Institute of Physics, 1988, 53, pp.1720. ⟨in2p3-00017473⟩

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