Skip to Main content Skip to Navigation
Journal articles

Analysis of UV-laser induced oxidation of implanted silicon by optical reflectivity measurements

Complete list of metadata

http://hal.in2p3.fr/in2p3-00017479
Contributor : Yvette Heyd <>
Submitted on : Tuesday, September 26, 2000 - 4:34:59 PM
Last modification on : Thursday, April 23, 2020 - 2:26:19 PM

Identifiers

  • HAL Id : in2p3-00017479, version 1

Collections

Citation

F. Foulon, A. Slaoui, E. Fogarassy, C. Fuchs, P. Siffert. Analysis of UV-laser induced oxidation of implanted silicon by optical reflectivity measurements. Applied physics. A, Materials science & processing, Springer Verlag, 1988, 47, pp.255. ⟨in2p3-00017479⟩

Share

Metrics

Record views

224