http://hal.in2p3.fr/in2p3-00017603 Contributor : Yvette HeydConnect in order to contact the contributor Submitted on : Thursday, September 28, 2000 - 10:21:04 AM Last modification on : Thursday, April 23, 2020 - 2:26:19 PM
J.P. Ponpon, A. Saulnier, R. Stuck. Behaviour of implanted arsenic during rapid thermal annealing of Ti on Si. Applied physics. A, Materials science & processing, Springer Verlag, 1987, 44, pp.227. ⟨in2p3-00017603⟩