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Optical characteristics of thin silicon films deposited by CVD and annealed by pulsed laser

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http://hal.in2p3.fr/in2p3-00017865
Contributor : Yvette Heyd Connect in order to contact the contributor
Submitted on : Wednesday, October 18, 2000 - 8:56:12 AM
Last modification on : Thursday, April 23, 2020 - 2:26:19 PM

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  • HAL Id : in2p3-00017865, version 1

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M.O. Lampert, J.C. Muller, J.P. Ponpon, P. Siffert. Optical characteristics of thin silicon films deposited by CVD and annealed by pulsed laser. Radiation Effects, 1982, 63, pp.169. ⟨in2p3-00017865⟩

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