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Laser annealing of silicon layers amorphized by molecular ions

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http://hal.in2p3.fr/in2p3-00017909
Contributor : Yvette Heyd Connect in order to contact the contributor
Submitted on : Friday, October 27, 2000 - 8:29:58 AM
Last modification on : Thursday, April 23, 2020 - 2:26:19 PM

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  • HAL Id : in2p3-00017909, version 1

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J.C. Muller, J.J. Grob, A. Grob, R. Stuck, P. Siffert. Laser annealing of silicon layers amorphized by molecular ions. Radiation Effects, 1980, 48, pp.115. ⟨in2p3-00017909⟩

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