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Formation of Palladium silicide by rapid thermal annealing

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http://hal.in2p3.fr/in2p3-00018090
Contributor : Yvette Heyd Connect in order to contact the contributor
Submitted on : Thursday, November 16, 2000 - 3:34:41 PM
Last modification on : Thursday, April 23, 2020 - 2:26:19 PM

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  • HAL Id : in2p3-00018090, version 1

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D. Levy, A. Grob, J.J. Grob, J.P. Ponpon. Formation of Palladium silicide by rapid thermal annealing. Applied physics. A, Materials science & processing, Springer Verlag, 1984, 35, pp.141. ⟨in2p3-00018090⟩

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