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Submitted on : Friday, December 22, 2000 - 9:45:54 AM Last modification on : Thursday, April 23, 2020 - 2:26:20 PM
P. Sebillotte, M. Badanoiu, V.B. Ndocko-Ndongue, P. Siffert. Low energy boron implantation profiles in silicon from junction depth measurements. Radiation Effects, 1971, 7, pp.7-15. ⟨in2p3-00018479⟩