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Influence of dilution in nitrogen on the photodissociation processes of silane and disilane at 193 nm

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http://hal.in2p3.fr/in2p3-00018827
Contributor : Yvette Heyd <>
Submitted on : Tuesday, January 23, 2001 - 8:18:02 AM
Last modification on : Thursday, April 23, 2020 - 2:26:20 PM

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  • HAL Id : in2p3-00018827, version 1

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E. Boch, C. Fuchs, E. Fogarassy, P. Siffert. Influence of dilution in nitrogen on the photodissociation processes of silane and disilane at 193 nm. Applied Surface Science, Elsevier, 1989, 43, pp.17-22. ⟨in2p3-00018827⟩

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