Annealing kinetics during rapid thermal processing of excimer laser-induced defects in virgin silicon

B. Hartiti; A. Slaoui; J.C. Muller; P. Siffert

Annealing kinetics during rapid thermal processing of excimer laser-induced defects in virgin silicon

B. Hartiti ¹ A. Slaoui ¹ J.C. Muller ¹ P. Siffert ¹

1 IReS - Institut de Recherches Subatomiques

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Journal articles

Applied Surface Science, Elsevier, 1990, 46, pp.371-374

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Submitted on : Wednesday, May 30, 2001 - 11:05:37 AM
Last modification on : Wednesday, May 30, 2001 - 11:05:37 AM

Annealing kinetics during rapid thermal processing of excimer laser-induced defects in virgin silicon

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