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A study of 2 MeV oxygen implantation to form deeply buried SiO$_2$ layers

J.J. Grob 1 A. Grob 1 P. Thevenin 1 P. Siffert 1 C. d'Anterroches A. Golanski
1 IReS - Institut de Recherches Subatomiques
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http://hal.in2p3.fr/in2p3-00019452
Contributor : Yvette Heyd Connect in order to contact the contributor
Submitted on : Wednesday, May 30, 2001 - 1:42:13 PM
Last modification on : Thursday, April 23, 2020 - 2:26:20 PM

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J.J. Grob, A. Grob, P. Thevenin, P. Siffert, C. d'Anterroches, et al.. A study of 2 MeV oxygen implantation to form deeply buried SiO$_2$ layers. Journal of Materials Research, Cambridge University Press (CUP), 1989, 4, pp.1227-1232. ⟨in2p3-00019452⟩

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