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Calculated temperature distribution during laser annealing in silicon and cadmium telluride

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http://hal.in2p3.fr/in2p3-00019490
Contributor : Yvette Heyd Connect in order to contact the contributor
Submitted on : Thursday, May 31, 2001 - 2:16:18 PM
Last modification on : Wednesday, February 17, 2021 - 11:50:25 AM

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  • HAL Id : in2p3-00019490, version 1
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R.O. Bell, M. Toulemonde, P. Siffert. Calculated temperature distribution during laser annealing in silicon and cadmium telluride. Applied Physics, Springer-Verlag, 1979, 19, pp.313-319. ⟨in2p3-00019490⟩

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