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Shrinkage mechanism of nanocavities in amorphous Si under ion irradiation: An in situ study

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http://hal.in2p3.fr/in2p3-00022247
Contributor : Jocelyne Lorgeril Connect in order to contact the contributor
Submitted on : Thursday, September 9, 2004 - 5:29:42 PM
Last modification on : Wednesday, September 16, 2020 - 4:07:08 PM

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  • HAL Id : in2p3-00022247, version 1

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M.O. Ruault, M.C. Ridgway, F. Fortuna, H. Bernas, J.S. Williams. Shrinkage mechanism of nanocavities in amorphous Si under ion irradiation: An in situ study. Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, Elsevier, 2003, 206, pp.912-915. ⟨in2p3-00022247⟩

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