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Study of the plasma near the plasma electrode by probes and photodetachment in ECR-driven negative ion source

Abstract : The effect of the plasma electrode bias on the plasma characteristics near the extraction aperture in a large volume hybrid multicusp negative ion source, driven by 2.45 GHz microwaves, is reported. Spatially resolved negative ion and electron density measurements were performed under various pressures (1-4 mTorr) by means of electrostatic probe and photodetachment technique.
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http://hal.in2p3.fr/in2p3-00336457
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Submitted on : Wednesday, November 12, 2008 - 9:58:10 AM
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M. Bacal, P. Svarnas, S. Béchu, J. Pelletier. Study of the plasma near the plasma electrode by probes and photodetachment in ECR-driven negative ion source. 1st International Conference on Negative Ions, Beams and Sources (NIBS 2008), Sep 2008, Aix en Provence, France. pp.47-54, ⟨10.1063/1.3112547⟩. ⟨in2p3-00336457⟩

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