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Plasma-blased ion implantation and deposition: A review of physics, technology, and applications

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http://hal.in2p3.fr/in2p3-00394474
Contributor : Emmanuelle Vernay <>
Submitted on : Thursday, June 11, 2009 - 6:14:34 PM
Last modification on : Thursday, March 11, 2021 - 10:36:02 AM

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Jean Pelletier, A. Anders. Plasma-blased ion implantation and deposition: A review of physics, technology, and applications. IEEE Transactions on Plasma Science, Institute of Electrical and Electronics Engineers, 2005, 33, pp.1944-1959. ⟨10.1109/TPS.2005.860079⟩. ⟨in2p3-00394474⟩

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