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Advances and drawbacks of microwave plasmas for surface processing

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http://hal.in2p3.fr/in2p3-00399341
Contributor : Emmanuelle Vernay <>
Submitted on : Friday, June 26, 2009 - 10:59:36 AM
Last modification on : Thursday, November 19, 2020 - 12:58:54 PM

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  • HAL Id : in2p3-00399341, version 1

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A. Lacoste, J. Pelletier, M. Moisan, C. Héau, B. Schmidt. Advances and drawbacks of microwave plasmas for surface processing. 17th International Colloquium on PLASMA PROCESSES (CIP09), Jun 2009, Marseille, France. ⟨in2p3-00399341⟩

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