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Using mass-flow controllers for obtaining extremely stable ECR ion source beams

Abstract : Beam stability and reproducibility is of paramount importance in applications requiring precise control of implanted radiation dose, like in the case of Hadrontherapy. The beam intensity over several weeks or months should be kept constant. Moreover, the timing for changing the nature of the beam and, as a consequence, the tuning of the source should be minimized. Standard valves usually used in conjunction of ECR ion sources have the disadvantage of controlling the conductance, which can vary significantly with external conditions, like ambient temperature and inlet pressure of the gas. The use of flow controllers is the natural way for avoiding these external constraints. In this contribution we present the results obtained using a new model of Mass-flow controller in the source Supernanogan, for production of C4+ and H3+ beams. Extremely stable beams (± 2.5%) without retuning of the source over several weeks could be obtained. The reproducibility of the source tuning parameters could also be demonstrated.
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http://hal.in2p3.fr/in2p3-00608072
Contributor : Michel Lion <>
Submitted on : Tuesday, July 12, 2011 - 12:40:12 PM
Last modification on : Thursday, February 1, 2018 - 1:33:18 AM
Long-term archiving on: : Sunday, December 4, 2016 - 10:59:42 PM

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  • HAL Id : in2p3-00608072, version 1

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X. Donzel, W. Bougy, N. Brionne, G. Gaubert, A. Sineau, et al.. Using mass-flow controllers for obtaining extremely stable ECR ion source beams. XIXth International Workshop on ECR Ion Sources (ECRIS 2010), Aug 2010, Grenoble, France. pp.127. ⟨in2p3-00608072⟩

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