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Wafer-scale fabrication of magneto-photonic structures in Bismuth Iron Garnet thin film

L. Magdenko 1 E. Popova 2 M. Vanwolleghem 1 C. Pang 1 F. Fortuna 3 T. Maroutian 1 P. Beauvillain 1 N. Keller 2 B. Dagens 1
1 IEF - Institut d'électronique fondamentale
2 GEMAC - Groupe d'Etude de la Matière Condensée
3 CSNSM PS2
CSNSM - Centre de Spectrométrie Nucléaire et de Spectrométrie de Masse, CSNSM - Centre de Sciences Nucléaires et de Sciences de la Matière
Abstract : In this paper we report on a reproducible technological process for wafer-scale fabrication of different photonic structures in Bismuth Iron Garnet (BIG: Bi(3)Fe(5)O(12)) thin films: two-dimensional magneto-photonic crystals (PhC), ring circulators, Bragg gratings or ridge waveguides. Different fabrication techniques such as Ion Beam Etching (IBE), Focused Ion Beam (FIB) etching, wet chemical etching and Reactive Ion etching are compared. The transfer of different geometries in BIG is obtained with good etching verticality and conservation of the dimensions using Inductively Coupled Plasma Reactive Ion Etching (ICP-RIE). This work demonstrates the possibility of wafer-scale high-quality nanostructuration of crystalline garnet thin films for magneto-photonic devices. (C) 2010 Elsevier B.V. All rights reserved.
Keywords : BIG Magnetooptics 20 photonic crystal ICP IBE FIB
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http://hal.in2p3.fr/in2p3-00670135
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Submitted on : Tuesday, February 14, 2012 - 4:09:34 PM
Last modification on : Monday, January 4, 2021 - 10:48:05 AM

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L. Magdenko, E. Popova, M. Vanwolleghem, C. Pang, F. Fortuna, et al.. Wafer-scale fabrication of magneto-photonic structures in Bismuth Iron Garnet thin film. Microelectronic Engineering, Elsevier, 2010, 87, pp.2437-2442. ⟨10.1016/j.mee.2010.04.021⟩. ⟨in2p3-00670135⟩

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