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The multi beam sputtering: a new thin film deposition approach

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http://hal.in2p3.fr/in2p3-00697281
Contributor : Emmanuelle Vernay <>
Submitted on : Tuesday, May 15, 2012 - 9:49:38 AM
Last modification on : Thursday, November 19, 2020 - 12:59:02 PM

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  • HAL Id : in2p3-00697281, version 1

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P. Sortais, J. Médard. The multi beam sputtering: a new thin film deposition approach. 39th International Conference on Metallurgical Coatings and Thin Films (ICMCTF), Apr 2012, San Diego, United States. ⟨in2p3-00697281⟩

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