Optical and structural properties of silicon oxynitride deposited by plasma enhanced chemical vapor deposition

J. Dupuis 1 E. Fourmond 1 D. Ballutaud 2 N. Bererd 3 M. Lemiti 1
1 INL - PV - INL - Photovoltaïque
INL - Institut des Nanotechnologies de Lyon
2 GEMAC - Groupe d'Etude de la Matière Condensée
3 ACE
IPNL - Institut de Physique Nucléaire de Lyon
Abstract : 1 Corresponding author.
Keywords : UCBL 43 boulevard du 11 novembre 1918 69622 Villeurbanne cedex France
Document type :
Journal articles
Complete list of metadatas

Cited literature [38 references]  Display  Hide  Download
http://hal.in2p3.fr/in2p3-00734027
Contributor : Sylvie Flores <>
Submitted on : Thursday, January 10, 2019 - 9:42:42 AM
Last modification on : Tuesday, November 19, 2019 - 2:37:06 AM
Long-term archiving on : Thursday, April 11, 2019 - 3:00:21 PM

File

J.Dupuis - Optical and structu...
Files produced by the author(s)

Identifiers

Collections

IN2P3 | INSA-GROUPE | GEMAC | UVSQ | INL | EC-LYON | INSA-LYON | UNIV-LYON1 | CNRS | IPNL | IP2I

Citation

J. Dupuis, E. Fourmond, D. Ballutaud, N. Bererd, M. Lemiti. Optical and structural properties of silicon oxynitride deposited by plasma enhanced chemical vapor deposition. Thin Solid Films, Elsevier, 2010, 519, pp.1325-1333. ⟨10.1016/j.tsf.2010.09.036⟩. ⟨in2p3-00734027⟩

Export

BibTeX TEI DC DCterms EndNote

Share

Metrics

Record views

277

Files downloads

278

Contact

CCSD