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Optical and structural properties of silicon oxynitride deposited by plasma enhanced chemical vapor deposition

J. Dupuis 1 E. Fourmond 1 D. Ballutaud 2 N. Bererd 3 M. Lemiti 1
1 INL - PV - INL - Photovoltaïque
INL - Institut des Nanotechnologies de Lyon
2 GEMAC - Groupe d'Etude de la Matière Condensée
3 ACE
IP2I Lyon - Institut de Physique des 2 Infinis de Lyon
Abstract : 1 Corresponding author.
Keywords : UCBL 43 boulevard du 11 novembre 1918 69622 Villeurbanne cedex France
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J. Dupuis, E. Fourmond, D. Ballutaud, N. Bererd, M. Lemiti. Optical and structural properties of silicon oxynitride deposited by plasma enhanced chemical vapor deposition. Thin Solid Films, Elsevier, 2010, 519, pp.1325-1333. ⟨10.1016/j.tsf.2010.09.036⟩. ⟨in2p3-00734027⟩

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