Optical and structural properties of silicon oxynitride deposited by plasma enhanced chemical vapor deposition

J. Dupuis; E. Fourmond; D. Ballutaud; N. Bererd; M. Lemiti

doi:10.1016/j.tsf.2010.09.036

Journal articles

Optical and structural properties of silicon oxynitride deposited by plasma enhanced chemical vapor deposition

J. Dupuis ¹ E. Fourmond ¹ D. Ballutaud ² N. Bererd ³ M. Lemiti ¹

1 INL - PV - INL - Photovoltaïque

INL - Institut des Nanotechnologies de Lyon

2 GEMAC - Groupe d'Etude de la Matière Condensée

3 ACE

IP2I Lyon - Institut de Physique des 2 Infinis de Lyon

Abstract : 1 Corresponding author.

Keywords : UCBL 43 boulevard du 11 novembre 1918 69622 Villeurbanne cedex France

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Journal articles

Domain :

Chemical Sciences / Radiochemistry

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Optical and structural properties of silicon oxynitride deposited by plasma enhanced chemical vapor deposition

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