Optical and structural properties of silicon oxynitride deposited by plasma enhanced chemical vapor deposition

J. Dupuis; E. Fourmond; D. Ballutaud; N. Bererd; M. Lemiti

Optical and structural properties of silicon oxynitride deposited by plasma enhanced chemical vapor deposition

J. Dupuis ¹ E. Fourmond ¹ D. Ballutaud ² N. Bererd ³ M. Lemiti ¹

1 INL - PV - INL - Photovoltaïque

INL - Institut des Nanotechnologies de Lyon

2 GEMAC - Groupe d'Etude de la Matière Condensée

3 ACE

IPNL - Institut de Physique Nucléaire de Lyon

Abstract : 1 Corresponding author.

Keywords : UCBL 43 boulevard du 11 novembre 1918 69622 Villeurbanne cedex France

Document type :

Journal articles

Domain :

Chemical Sciences / Radiochemistry

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http://hal.in2p3.fr/in2p3-00734027
Contributor : Sylvie Flores <>
Submitted on : Thursday, January 10, 2019 - 9:42:42 AM
Last modification on : Wednesday, March 6, 2019 - 11:28:05 AM
Long-term archiving on : Thursday, April 11, 2019 - 3:00:21 PM

J.Dupuis - Optical and structu...

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Optical and structural properties of silicon oxynitride deposited by plasma enhanced chemical vapor deposition

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