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Poster communications

Investigation of Mg2(Si,Sn) thin films deposited by microwave plasma-assisted co-sputtering

C. Prahoveanu 1 A. Lacoste 1 L. Laversenne 2 C. de Vaulx K. Azzouz
1 LPSC - Laboratoire de Physique Subatomique et de Cosmologie
2 MRS - Matériaux, Rayonnements, Structure
NEEL - Institut Néel
Document type :
Poster communications
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http://hal.in2p3.fr/in2p3-01009968
Contributor : Emmanuelle Vernay <>
Submitted on : Thursday, June 19, 2014 - 9:00:49 AM
Last modification on : Friday, December 18, 2020 - 1:14:03 PM

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  • HAL Id : in2p3-01009968, version 1

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IN2P3 | CNRS | NEEL | UGA | LPSC-PLASMAS | LPSC | GEPI

Citation

C. Prahoveanu, A. Lacoste, L. Laversenne, C. de Vaulx, K. Azzouz. Investigation of Mg2(Si,Sn) thin films deposited by microwave plasma-assisted co-sputtering. GDR Thermoélectricité 2013, 2013, Nancy, France. ⟨in2p3-01009968⟩

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