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Poster communications

Plasma enhanced oxidation of nickel silicides at low temperature

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Poster communications
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http://hal.in2p3.fr/in2p3-01017375
Contributor : Emmanuelle Vernay <>
Submitted on : Wednesday, July 2, 2014 - 1:02:32 PM
Last modification on : Thursday, November 19, 2020 - 12:58:53 PM

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  • HAL Id : in2p3-01017375, version 1

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E. Sarigiannidou, A. Lacoste, J. Elsabahy, A. Bès, B. Doisneau, et al.. Plasma enhanced oxidation of nickel silicides at low temperature. E-MRS (European Materials Research Society) 2013 Spring Meeting, May 2013, Strasbourg, France. ⟨in2p3-01017375⟩

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