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Poster communications
Plasma enhanced oxidation of nickel silicides at low temperature
B. Doisneau
Author
Hervé Roussel
Author IdHAL : herve-roussel ORCID : https://orcid.org/0000-0001-6110-5760
R. Madar
Author
1
LPSC - Laboratoire de Physique Subatomique et de Cosmologie (53 avenue des Martyrs - 38026 Grenoble Cedex - France)
- Grenoble INP - Institut polytechnique de Grenoble - Grenoble Institute of Technology (46 avenue Félix Viallet 38031 Grenoble Cedex 1 - France)
- Institut Polytechnique de Grenoble - Grenoble Institute of Technology (France)
- IN2P3 - Institut National de Physique Nucléaire et de Physique des Particules du CNRS (France)
- UJF - Université Joseph Fourier - Grenoble 1 (BP 53 - 38041 Grenoble Cedex 9 - France)
- CNRS - Centre National de la Recherche Scientifique : UMR5821 (France)
Document type :
Poster communications
Complete list of metadata
http://hal.in2p3.fr/in2p3-01017375
Contributor : Emmanuelle Vernay Connect in order to contact the contributor
Submitted on : Wednesday, July 2, 2014 - 1:02:32 PM
Last modification on : Thursday, November 19, 2020 - 12:58:53 PM
Contributor : Emmanuelle Vernay Connect in order to contact the contributor
Submitted on : Wednesday, July 2, 2014 - 1:02:32 PM
Last modification on : Thursday, November 19, 2020 - 12:58:53 PM
Identifiers
- HAL Id : in2p3-01017375, version 1
Citation
E. Sarigiannidou, A. Lacoste, J. Elsabahy, A. Bès, B. Doisneau, et al.. Plasma enhanced oxidation of nickel silicides at low temperature. E-MRS (European Materials Research Society) 2013 Spring Meeting, May 2013, Strasbourg, France. ⟨in2p3-01017375⟩
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