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MgH2 thin films deposited by one-step reactive plasma sputtering

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http://hal.in2p3.fr/in2p3-01068590
Contributor : Emmanuelle Vernay <>
Submitted on : Friday, September 26, 2014 - 8:51:58 AM
Last modification on : Wednesday, September 30, 2020 - 9:46:03 AM

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H. Le-Quoc, A. Lacoste, S. Miraglia, S. Béchu, A. Bès, et al.. MgH2 thin films deposited by one-step reactive plasma sputtering. International Journal of Hydrogen Energy, Elsevier, 2014, 39 (31), pp.17718-17725. ⟨10.1016/j.ijhydene.2014.08.096⟩. ⟨in2p3-01068590⟩

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