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Continuous Deposition of Organo-Chlorinated Thin Films by Atmospheric Pressure Dielectric Barrier Discharge in a Wire-Cylinder Configuration

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http://hal.in2p3.fr/in2p3-01094299
Contributor : Emmanuelle Vernay <>
Submitted on : Friday, December 12, 2014 - 9:24:24 AM
Last modification on : Thursday, November 19, 2020 - 12:59:04 PM

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C. Vandenabeele, R. Maurau, S. Bulou, F. Siffer, M. Gérard, et al.. Continuous Deposition of Organo-Chlorinated Thin Films by Atmospheric Pressure Dielectric Barrier Discharge in a Wire-Cylinder Configuration. Plasma Processes and Polymers, Wiley-VCH Verlag, 2014, 11 (11), pp.1089-1101. ⟨10.1002/ppap.201400098⟩. ⟨in2p3-01094299⟩

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