 |
 |
 |
Journal articles
In-Plane Epitaxial Growth of Silicon Nanowires and Junction Formation on Si(100) Substrates
Abstract : Growing self-assembled silicon nanowires (SiNWs) into precise locations represents a critical capability to scale up SiNW-based functionalities. We here report a novel epitaxy growth phenomenon and strategy to fabricate orderly arrays of self-aligned in-plane SiNWs on Si(100) substrates following exactly the underlying crystallographic orientations. We observe also a rich set of distinctive growth dynamics/modes that lead to remarkably different morphologies of epitaxially grown SiNWs/or grains under variant growth balance conditions. High-resolution transmission electron microscopy cross-section analysis confirms a coherent epitaxy (or partial epitaxy) interface between the in-plane SiNWs and the Si(100) substrate, while conductive atomic force microscopy characterization reveals that electrically rectifying p-n junctions are formed between the p-type doped in-plane SiNWs and the n-type c-Si(100) substrate. This in-plane epitaxy growth could provide an effective means to define nanoscale junction and doping profiles, providing a basis for exploring novel nanoelectronics.
http://hal.in2p3.fr/in2p3-01100533
Contributor : Emilie Bonnardel <>
Submitted on : Tuesday, January 6, 2015 - 3:43:19 PM
Last modification on : Wednesday, September 16, 2020 - 5:43:42 PM
Contributor : Emilie Bonnardel <>
Submitted on : Tuesday, January 6, 2015 - 3:43:19 PM
Last modification on : Wednesday, September 16, 2020 - 5:43:42 PM