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Uniform non-stoichiometric titanium nitride thin films for improved kinetic inductance detector array

G. Coiffard 1, 2 K-F. Schuster 1 E. F. C. Driessen 1 S. Pignard 2 M. Calvo 3 A. Catalano 4 J. Goupy 5 A. Monfardini 5, 4
1 IRAM - Institut de RadioAstronomie Millimétrique
2 LMGP - Laboratoire des matériaux et du génie physique
3 Cryo - Cryogénie
NEEL - Institut Néel
4 LPSC - Laboratoire de Physique Subatomique et de Cosmologie
5 HELFA - Hélium : du fondamental aux applications
NEEL - Institut Néel
Abstract : We describe the fabrication of homogeneous sub-stoichiometric titanium nitride films for microwave kinetic inductance detector (mKID) arrays. Using a 6 inch sputtering target and a homogeneous nitrogen inlet, the variation of the critical temperature over a 2 inch wafer was reduced to <25 %. Measurements of a 132-pixel mKID array from these films reveal a sensitivity of 16 kHz/pW in the 100 GHz band, comparable to the best aluminium mKIDs. We measured a noise equivalent power of NEP = 3.6e-15 Hz/Hz^(1/2). Finally, we describe possible routes to further improve the performance of these TiN mKID arrays.
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http://hal.in2p3.fr/in2p3-01213949
Contributor : Emmanuelle Vernay <>
Submitted on : Friday, October 9, 2015 - 2:37:10 PM
Last modification on : Friday, November 20, 2020 - 10:46:02 AM

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G. Coiffard, K-F. Schuster, E. F. C. Driessen, S. Pignard, M. Calvo, et al.. Uniform non-stoichiometric titanium nitride thin films for improved kinetic inductance detector array. Journal of Low Temperature Physics, Springer Verlag (Germany), 2016, 184 (3-4), pp.654-660. ⟨10.1007/s10909-016-1489-9⟩. ⟨in2p3-01213949⟩

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