CMOS pixel sensors on high resistive substrate for high-rate, high-radiation environments

Abstract : A depleted CMOS active pixel sensor (DMAPS) has been developed on a substrate with high resistivity in a high voltage process. High radiation tolerance and high time resolution can be expected because of the charge collection by drift. A prototype of DMAPS was fabricated in a 150. nm process by LFoundry. Two variants of the pixel layout were tested, and the measured depletion depths of the variants are 166. μm and 80. μm. We report the results obtained with the prototype fabricated in this technology.
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http://hal.in2p3.fr/in2p3-01308860
Contributor : Danielle Cristofol <>
Submitted on : Thursday, April 28, 2016 - 3:18:49 PM
Last modification on : Thursday, January 18, 2018 - 1:55:10 AM

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  • HAL Id : in2p3-01308860, version 1

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T. Hirono, M. Barbero, P. Breugnon, S. Godiot, T. Hemperek, et al.. CMOS pixel sensors on high resistive substrate for high-rate, high-radiation environments. 10th International "Hiroshima" Symposium on the Development and Application of Semiconductor Tracking Detectors, Sep 2015, Xi'an, China. ⟨in2p3-01308860⟩

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