Mg-Ti-H films deposited by reactive plasma sputtering for hydrogen storage applications

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Poster communications
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http://hal.in2p3.fr/in2p3-01325384
Contributor : Emmanuelle Vernay <>
Submitted on : Thursday, June 2, 2016 - 10:58:01 AM
Last modification on : Wednesday, February 13, 2019 - 10:06:09 AM

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  • HAL Id : in2p3-01325384, version 1

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I. Iliescu, A. Bes, L. Laversenne, A. Lacoste. Mg-Ti-H films deposited by reactive plasma sputtering for hydrogen storage applications. Hybrides as Energy Materials (HYDEM2016), Jun 2016, Aarhus, Denmark. ⟨in2p3-01325384⟩

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