Reactive gas pulsing sputtering process, a promising technique to elaborate silicon oxynitride multilayer nanometric antireflective coatings

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Submitted on : Tuesday, January 10, 2017 - 10:29:08 AM
Last modification on : Wednesday, October 24, 2018 - 10:22:10 AM

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F Farhaoui, A. Bousquet, R Smaali, A. Moreau, E Centeno, et al.. Reactive gas pulsing sputtering process, a promising technique to elaborate silicon oxynitride multilayer nanometric antireflective coatings. Journal of Physics D: Applied Physics, IOP Publishing, 2017, 50 (1), pp.015306. ⟨10.1088/1361-6463/50/1/015306⟩. ⟨in2p3-01430655⟩

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