Photometric calibration of an in situ broadband optical thickness monitoring of thin films in a large vacuum chamber

David Hofman 1 Benoit Sassolas 1 Christophe Michel 1 Laurent Balzarini 1 Laurent Pinard 1 Julien Teillon 1 Bertrand David 1 Bernard Lagrange 1 Eleonore Barthelemy-Mazot 1 Gianpietro Cagnoli 1
1 LMA - Laboratoire des matériaux avancés
Abstract : To improve the in situ monitoring of thin films at the Laboratoire des Matériaux Avancés, a broadband optical monitoring of the coated thin films was developed and installed in the biggest ion-beam sputtering machine in the world. Due to the configuration of the coating machine and the chamber strain under vacuum, a standard calibration procedure is impossible and a double-beam optical system is not suitable. A novel theoretical and practical solution to calibrate the measurements was found and is described in this paper. Some relevant results achieved thanks to this technique are discussed as well.
Keywords : (1205240) Photometry (1205700) Reflection OCIS codes: (3101860) Deposition and fabrication
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Article dans une revue
Applied optics, Optical Society of America, 2017, 56, pp.409 - 409. 〈10.1364/AO.56.000409〉
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David Hofman, Benoit Sassolas, Christophe Michel, Laurent Balzarini, Laurent Pinard, et al.. Photometric calibration of an in situ broadband optical thickness monitoring of thin films in a large vacuum chamber. Applied optics, Optical Society of America, 2017, 56, pp.409 - 409. 〈10.1364/AO.56.000409〉. 〈in2p3-01452267〉

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