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Journal articles
Photometric calibration of an in situ broadband optical thickness monitoring of thin films in a large vacuum chamber
Abstract : To improve the in situ monitoring of thin films at the Laboratoire des Matériaux Avancés, a broadband optical monitoring of the coated thin films was developed and installed in the biggest ion-beam sputtering machine in the world. Due to the configuration of the coating machine and the chamber strain under vacuum, a standard calibration procedure is impossible and a double-beam optical system is not suitable. A novel theoretical and practical solution to calibrate the measurements was found and is described in this paper. Some relevant results achieved thanks to this technique are discussed as well.
Cited literature [6 references]
http://hal.in2p3.fr/in2p3-01452267
Contributor : Laurent Pinard <>
Submitted on : Thursday, February 2, 2017 - 10:28:01 AM
Last modification on : Thursday, November 21, 2019 - 2:40:53 AM
Document(s) archivé(s) le : Friday, May 5, 2017 - 11:52:57 AM
Contributor : Laurent Pinard <>
Submitted on : Thursday, February 2, 2017 - 10:28:01 AM
Last modification on : Thursday, November 21, 2019 - 2:40:53 AM
Document(s) archivé(s) le : Friday, May 5, 2017 - 11:52:57 AM
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