Morphology and microstructure of Mg-Ti-H films deposited by microwave plasma-assisted co-sputtering

Abstract : Mg-Ti-H films with a Ti content in the range 0 at.% Ti < 20 were obtained in a single-step process using the microwave reactive plasma-assisted co-sputtering technique. The morphology, crystal structure, chemical composition and spatial distribution of the elements were investigated by X-ray diffraction, scanning and transmission electron microscopy coupled with energy-dispersive X-ray spectroscopy and precession electron diffraction. Our results show that the Ti-poor films (0 at.% Ti 0.45) exhibit mainly the tetragonal beMgH2 phase and have a dense microstructure with discontinuous columnar grains. For the films with a medium Ti content (2.7 at.% Ti 6.6), the beMgH2, metastable orthorhombic geMgH2 and Mg-Ti phases were found in different proportions, with a typical columnar growth. The abrupt microstructural changes of the films with a Ti content >10 at.% correlate with the change in crystallinity. These films exhibit a mainly amorphous/nanocrystalline structure with a granular morphology. We showed that the Ti content plays a significant role in the formation of structural and microstructural features of the Mg-Ti-H films, which might be a useful parameter in tuning the functional properties of magnesium hydride.
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Journal of Alloys and Compounds, Elsevier, 2017, 708, pp.489 - 499. 〈10.1016/j.jallcom.2017.03.044〉
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Soumis le : vendredi 31 mars 2017 - 15:34:56
Dernière modification le : lundi 9 avril 2018 - 12:22:10

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I. Iliescu, N. Skryabina, D. Fruchart, A. Bes, A. Lacoste. Morphology and microstructure of Mg-Ti-H films deposited by microwave plasma-assisted co-sputtering. Journal of Alloys and Compounds, Elsevier, 2017, 708, pp.489 - 499. 〈10.1016/j.jallcom.2017.03.044〉. 〈in2p3-01499524〉

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