Skip to Main content Skip to Navigation
Journal articles

Morphology and microstructure of Mg-Ti-H films deposited by microwave plasma-assisted co-sputtering

Abstract : Mg-Ti-H films with a Ti content in the range 0 at.% Ti < 20 were obtained in a single-step process using the microwave reactive plasma-assisted co-sputtering technique. The morphology, crystal structure, chemical composition and spatial distribution of the elements were investigated by X-ray diffraction, scanning and transmission electron microscopy coupled with energy-dispersive X-ray spectroscopy and precession electron diffraction. Our results show that the Ti-poor films (0 at.% Ti 0.45) exhibit mainly the tetragonal beMgH2 phase and have a dense microstructure with discontinuous columnar grains. For the films with a medium Ti content (2.7 at.% Ti 6.6), the beMgH2, metastable orthorhombic geMgH2 and Mg-Ti phases were found in different proportions, with a typical columnar growth. The abrupt microstructural changes of the films with a Ti content >10 at.% correlate with the change in crystallinity. These films exhibit a mainly amorphous/nanocrystalline structure with a granular morphology. We showed that the Ti content plays a significant role in the formation of structural and microstructural features of the Mg-Ti-H films, which might be a useful parameter in tuning the functional properties of magnesium hydride.
Complete list of metadata
Contributor : Emmanuelle Vernay Connect in order to contact the contributor
Submitted on : Friday, March 31, 2017 - 3:34:56 PM
Last modification on : Wednesday, November 3, 2021 - 7:01:46 AM




I. Iliescu, N. Skryabina, D. Fruchart, A. Bes, A. Lacoste. Morphology and microstructure of Mg-Ti-H films deposited by microwave plasma-assisted co-sputtering. Journal of Alloys and Compounds, Elsevier, 2017, 708, pp.489 - 499. ⟨10.1016/j.jallcom.2017.03.044⟩. ⟨in2p3-01499524⟩



Les métriques sont temporairement indisponibles