Influence of the magnetic field on the DC sputtering efficiency of an Inverted Cylindrical Magnetron (ICM)

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http://hal.in2p3.fr/in2p3-01573956
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Submitted on : Friday, August 11, 2017 - 11:04:56 AM
Last modification on : Wednesday, February 20, 2019 - 12:40:06 PM

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T. Le Coz, C. Vachey, S. Grosso, A. Bès, A. Lacoste, et al.. Influence of the magnetic field on the DC sputtering efficiency of an Inverted Cylindrical Magnetron (ICM) . 21th International Colloquium on Plasma Processes, 5th Magnetron Ion Processing & Arc Technologies European Conferene (CIP-MIATEC 2017), Jun 2017, Nice, France. ⟨in2p3-01573956⟩

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