Incorporation of -OH radicals in anodic silicon oxide films studied by secondary-ion mass spectroscopy, X-ray photoelectron spectroscopy and IR analysis

I. Montero; L. Galan; E. De La Cal; J.M. Albella; J.C. Pivin

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International Conference on Metallurgical Coatings 17 International Thin Film Conference 8, San Diego : United States

Incorporation of -OH radicals in anodic silicon oxide films studied by secondary-ion mass spectroscopy, X-ray photoelectron spectroscopy and IR analysis

I. Montero, L. Galan, E. De La Cal, J.M. Albella, J.C. Pivin¹

(1990)

1 :	CSNSM - Centre de Spectrométrie Nucléaire et de Spectrométrie de Masse


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Soumis le : Vendredi 7 Mai 1999, 11:31:33
Dernière modification le : Vendredi 7 Mai 1999, 11:31:33