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Structural and nuclear characterizations of defects created by noble gas implantation in silicon oxide Assaf H., Ntsoenzok E., Barthe M.-F., Ruault M.-O., Sauvage T. et al Dans Nuclear Instruments and Methods in Physics Research B - E-MRS IUMRS ICEM 2006 Spring Meeting - Symposium U: Si-based Materials for Advanced Microelectronic Devices: Synthesis, Defects and Diffusion, France [in2p3-00115973 - version 1]